Scheme 2.

Proposed polymethacrylate-based matrix network structure and the autonomic self-healing process with different TS concentrations. (A1 and A2) Polymethacrylate-based network formed by free radical polymerization, cationic ring-opening polymerization, and limited photoacid-induced sol-gel reaction in dry conditions after 40 s irradiation; (B1 and B2) photoacid-induced ring-opening polymerization and sol-gel reaction after 24 h; (C1 and C2) self-healing process via sol-gel reaction and ring-opening polymerization in wet environment. (The black, red, blue, brown, and yellow lines represent the formed polymethacrylate chain, polyether chain, methoxysilyl group, epoxy group, and silanol group, respectively. The green point stands for the new formed crosslink point after the light irradiation was off.)