Figure 6. Electrochromic performance of structures.
(a) Plot of transmittance modulation variation versus overlayer thickness for Ni(OH)2 deposited in photoresist templates with circular and oval patterns. The magnified SEM image above each column shows the surface morphology of each structure. Inset shows an example of the obtained bleached and colour state for the structured film. (b) Cyclic voltammetry characteristics of Ni(OH)2 deposited in photoresist template with oval shaped hole pattern with a 80 nm overlayer thickness, recorded at a scan rate of 10 mV s−1 up to 160 cycles. The arrows indicate the direction of the sweep during the cyclic voltammetry measurements.