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. Author manuscript; available in PMC: 2017 Oct 1.
Published in final edited form as: J Microelectromech Syst. 2016 Jul 29;25(5):963–967. doi: 10.1109/JMEMS.2016.2593339

Fig. 8.

Fig. 8

Etching depth as a function of etching time for different masks: ZEP520 (diamond), Cr (inverted triangle), SiO2 (triangle) and Cr on polymer (square).