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. 2016 Mar 9;17(1):45–57. doi: 10.1080/14686996.2016.1140306

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© 2016 The Author(s). Published by National Institute for Materials Science in partnership with Taylor & Francis

This is an Open Access article distributed under the terms of the Creative Commons Attribution License CC-BYhttp://creativecommons.org/licenses/by/4.0/which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Figure 2. — (a) XRD-2 diffractogram of 200 nm thick (110)-oriented PMN-PT film deposited on SRO(110)/CeO₂(001)/YSZ(001) trilayer system on a silicon substrate. The inset shows an expansion of the (110) reflections. (b) Corresponding φ-scan of the Si substrate and SRO bottom electrode. (c) XRD pattern of 200 nm thick (001)-oriented PMN-PT film deposited on a SRO(001/CeO₂(001)/YSZ(001) buffered Si substrate. The inset shows the (002) reflections. (d) Corresponding φ-scan of the Si substrate and SRO bottom electrode.