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. 2016 Aug 26;7(4):381–388. doi: 10.1016/j.shaw.2016.08.001

Table 3.

Pearson correlation coefficient among measurement devices

LAB (n = 1,631)
ENP (n = 1,539)
UNP (n = 3,027)
Total (n = 6,377)
SMPS Total ≤ 100 nm > 100 nm CPC SAM SMPS Total ≤ 100 nm > 100 nm CPC SAM SMPS Total ≤ 100 nm > 100 nm CPC SAM SMPS Total ≤ 100 nm > 100 nm CPC SAM
SMPS Total 1 1 1 1
≤100 nm 0.963 1 0.992 1 0.962 1 0.970 1
>100 nm 0.830 0.650 1 0.829 0.753 1 0.671 0.445 1 0.742 0.558 1
CPC 0.869 0.823 0.750 1 0.925 0.905 0.823 1 0.457 0.427 0.349 1 0.623 0.585 0.517 1
SAM 0.883 0.766 0.908 0.889 1 0.857 0.825 0.824 0.834 1 0.648 0.525 0.705 0.538 1 0.745 0.644 0.770 0.694 1

All results of Pearson correlation coefficient were p < 0.001.

CPC, condensation particle counter; ENP, engineered nanoparticle manufacturing workplace; LAB, laboratory; LEV, local exhaust ventilation; SAM, surface area monitor; SMPS, scanning mobility particle sizer; UNP, unintended nanoparticle emitted workplace.