Table 1.
S No | Year | Ref. | No of Sensors | Parameters Sensed | Substrate | CMOS Process | ||||||||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Flow Rate/Mass Flow | Wall Shear Stress | Pressure | Temperature | Gas | Density | Light Intensity | Electric Conductivity | Flow Direction | Humidity | Air Speed | Magnetic Field | Acceleration | Silicon | SOI | Yes | No | ||||
1 | 1987 | [9] | 3 | √ | √ | √ | √ | √ | ||||||||||||
2 | 1992 | [15] | 5 | √ | √ | √ | √ | √ | √ | √ | ||||||||||
3 | 1996 | [10] | 3 | √ | √ | √ | √ | √ | ||||||||||||
4 | 2000 | [2] | 4 | √ | √ | √ | √ | √ | √ | |||||||||||
5 | 2001 | [18] | 4 | √ | √ | √ | √ | |||||||||||||
6 | 2002 | [3] | 4 | √ | √ | √ | √ | |||||||||||||
7 | 2004 | [4] | 3 | √ | √ | √ | √ | √ | ||||||||||||
8 | 2005 | [11] | 4 | √ | √ | √ | √ | √ | √ | |||||||||||
9 | 2005 | [5] | 3 | √ | √ | √ | √ | √ | ||||||||||||
10 | 2005 | [17] | 3 | √ | √ | √ | √ 1 | √ 2 | ||||||||||||
11 | 2007 | [16] | 4 | √ | √ | √ | √ | √ | √ 2 | |||||||||||
12 | 2009 | [6] | 3 | √ | √ | √ | √ | √ | ||||||||||||
13 | 2011 | [8] | 2 | √ | √ | √ | √ | |||||||||||||
14 | 2013 | [7] | 8 | √ | √ | √ | √ | √ | √ | √ | √ | √ | √ |
1 Sensor chips have been fabricated using silicon wafers bonded with glass wafers; 2 non-CMOS Silicon/SOI sensor chips have been packaged with independent Bi-CMOS interface circuitry chips.