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. 2016 Dec 2;7:13705. doi: 10.1038/ncomms13705

Figure 4. Generation of optical vortex beams.

Figure 4

(a) Central portions of binary holographic masks for electron-beam induced generation of optical vortex beams with topological charge l=3, 6 and 9 and (b) corresponding angle-resolved emission intensity distribution maps (electron beam current=5.5–6.1 nA; integration time=30 s). (c) Mean radius of the ring-shaped vortex beam intensity profile (averaged over polar and azimuthal directions with s.d. error bars) as a function of topological charge l, with a fitting of the form A(l+1)1/2. The factor A is employed here as a fitting parameter, taking a value 3.937° (analytically40 it should depend on wavelength and propagation distance from the vortex beam source).