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. 2017 Jan 19;12:56. doi: 10.1186/s11671-017-1831-4

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© The Author(s). 2017

Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

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Fig. 14 — Mechanism causing the Cu seed layer missing due to sponge-like defects and deep scallops. a After Si etch. b After Cu seed layer deposition. c Microscopic image of the Cu seed layer deposited at 60 μm × 250 μm TSV [45]