Skip to main content
. 2017 Feb 1;50(Pt 1):172–183. doi: 10.1107/S1600576716019750

Figure 6.

Figure 6

(a) SXPD pattern of CeO2 powder standard and Rietveld refinement (main plot) produced from the two-dimensional pattern (inset). The measurement was performed using a beam of 25 keV [λ = 0.49466 (1) Å] and 60 s exposure time. (b) SXPD pattern of CeO2 powder standard and the refinement obtained using a beam of E = 30 keV [λ = 0.41100 (5) Å] and 300 s exposure time.