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. 2017 Jan 18;8:190–195. doi: 10.3762/bjnano.8.20

Figure 1.

Figure 1

SEM images of a Ti film (70 nm thick) after etching for (a) 60 and (b) 150 s. Images of a Ti film (430 nm thick) after etching for (c) 150 and (d) 190 s. Inset of panel (a): Ti film before the etching.