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. 2015 Aug 21;5(3):1397–1417. doi: 10.3390/nano5031397

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© 2015 by the authors; licensee MDPI, Basel, Switzerland.

This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/4.0/).

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X-ray photoelectron spectroscopy (XPS) spectra of the surface of the Ti, TAV, and TN substrate within the same morphology. (a) Wide scan XPS spectra of the surface of the TAV substrate after 10 mol/L-KOH treatment; (b) wide scan XPS spectra of the surface of the TN substrate after 20 mol/L-KOH treatment; (c) Ti_2p spectra of the surface of the Ti, TAV and TN substrate; (d) O_1s spectra of the surface of the Ti, TAV and TN substrate; (e) K_2p spectra of the surface of the Ti, TAV and TN substrate. Compared with untreated substrates, K_2p peaks were clearly observed in all the KOH-treated Ti, TAV and TN substrates. This indicates that K-incorporated end products are formed by Ti–O–K bonding due to the chemical changing.

X-ray photoelectron spectroscopy (XPS) spectra of the surface of the Ti, TAV, and TN substrate within the same morphology. (a) Wide scan XPS spectra of the surface of the TAV substrate after 10 mol/L-KOH treatment; (b) wide scan XPS spectra of the surface of the TN substrate after 20 mol/L-KOH treatment; (c) Ti_2p spectra of the surface of the Ti, TAV and TN substrate; (d) O_1s spectra of the surface of the Ti, TAV and TN substrate; (e) K_2p spectra of the surface of the Ti, TAV and TN substrate. Compared with untreated substrates, K_2p peaks were clearly observed in all the KOH-treated Ti, TAV and TN substrates. This indicates that K-incorporated end products are formed by Ti–O–K bonding due to the chemical changing.