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. 2013 Aug 7;3(3):469–485. doi: 10.3390/nano3030469

Figure 1.

Figure 1

Comparison of responses to 1, 2, 3, 4, 5 and 10 ppm NH3 for (a), (c) and (e), sensors, consisting of an untreated n-type porous silicon (PS) interface with those treated with (b) TiO2, (d) SnOx and (f) NiO fractional nanostructured island depositions. The PS interface in (a) is that treated with TiO2 in (b) and similarly for SnOx and NiO.