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Response of ethanethiol-treated tin oxide nanostructure-deposited porous silicon (PS) interface to NH3 after exposure for 30 s (green line) vs. only tin oxide (blue line). The response of the thiol-treated SnOx-deposited interface is consistent with the introduction of S-H groups on the interface and an increased Brønsted acidity relative to the PS- and SnOx-treated PS acidic sites (Figure 2) after a 30 s exposure.
