Table 2.

Results of EDS analysis for chemical elements of Ti surfaces

Elements	Groups
	CON	HF1	HF2	HF3
Ti (w%)	99.68	92.47	92.66	92.68
F (w%)	0	0.57	0.55	0.61
O (w%)	0.32	6.96	6.79	6.71

Notes: CON represents control titanium surface; HF1, HF2, and HF3 represent implants treated with 1% HF etched for 3 min, 0.5% HF etched for 12 min, and 1.5% HF etched for 12 min, respectively.

Abbreviations: EDS, energy-dispersive spectroscopy; w%, weight percentage; HF, hydrofluoric acid.