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. 2017 Feb 21;7:42479. doi: 10.1038/srep42479

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(a) XRD of as-deposited and annealed Tb₂O₃ films (~200 nm) at 500, 600, and 700 °C for 1 hour, respectively. (b) High-magnification TEM image of a Tb₂O₃ film.