Figure 4. Material characterization of NiMoO4 nanowires.
(a) Rietveld refined XRD pattern. (b) Low magnification SEM images. Scale bar, 3 μm (inset 30 μm). (c) High magnification SEM image. Scale bar, 300 nm. (d) TEM image. Scale bar, 50 nm. (e) HRTEM image. Scale bar, 10 nm. (f) SAED pattern. Scale bar, 2 nm−1.