Table 3.
Sources and mechanisms of fabricating POF gratings.
| Source | Wavelength | Mechanism | Reference |
|---|---|---|---|
| UV mercury lamp | multi lines | Photo-degradation | [75] |
| KrF excimer laser | 248 nm | - | [49,99,100,101,102] |
| XeCl excimer laser | 308 nm | - | [46] |
| UV laser OPO pulsed laser Dye laser He-Cd laser |
325 nm | photocrosslinking photopolymerization photoisomerization photolock polymer chain degradation photoblation due to high absorption |
[22,44,45,47,52,53,54,57,60,64,68,70,77,82,85,86,87,88,89,90,91,92,95,103,104,105,106,107,108,109,110,111,112,113,114,115,116,117,118,119,120,121,122,123,124,125,126,127,128,129] |
| Nd:YAG laser | 355 nm | polymerization photolock polymer chain degradation photocrosslinking |
[48,65,66,76,130] |
| Ti: sapphire fs laser | 387 nm | ultrashort photo-modification-polymer backbone cleavage & monomer production photocrosslinking |
[78,79,80,131] |
| Ti: sapphire fs laser | 400 nm | refractive index modification via 2-photon absorption | [84] |
| He-Cd laser | 421.8 nm | photoinduced birefringence | [69,74] |
| Ar+ laser | 501.7 nm | optical ring cleavage | [56] |
| Ar+ laser | 514 nm | - | [132] |
| fs laser | 517 nm | - | [133,134] |
| Nd:YVO4 laser | 532 nm | photoinduced birefringence | [67,71,72,73,135,136] |
| Ti:sapphire fs laser | 800 nm | refractive index modifications via 2-photon absorption | [81,137,138,139,140] |