Table 2. Comparison of graphene patterning obtained individually through three types of stencil masks by different magnetic-assisted UV/ozonation processes.

Mask type/Thickness	Nickel/10 μm	Sapphire/316 μm		Steel/30 μm
Magnetic field	0	0	BZ = 0.31 T, ∇BZ = 90 T/m	BZ = 19 mT, ∇BZ = 4.5 T/m	BZ = 0.31 T, ∇BZ = 90 T/m
Lateral under-oxidation/μm	4–5	>200	8	>30	3–4
Trait	Poor conformity	Magnetic-induced directional etching		Magnetic-enhanced conformity