Fig. 2. Fabrication of novel vertically aligned CNTs-based electrodes for the EHL patterning. Schematic representation and the corresponding SEM images of (a) CNTs arrays fabricated using the chemical vapour deposition process (CVD) and electron beam (e-beam) lithography combined with CVD growth process and (b) subsequently coated with a thin silicon layer to produce a range of top electrodes for EHL. Either as-grown (top) or inverted (bottom) arrays can be generated. (c) Small-diameter VACNT forests patterned into predesigned pillar structures with various dimensions and pitches are further utilized and coated with silicon (d) generating abroad range of masks for the CNT-EHL.