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. 2010 Jul 29;3(8):4109–4141. doi: 10.3390/ma3084109

Figure 1.

Figure 1

Typical energy ranges for different PVD processes. PIIID = plasma immersion ion implantation and deposition; IBAD = ion beam assisted deposition; PLD = pulsed laser deposition; VAD = vacuum arc deposition; IBA-MBE = ion beam assisted molecular beam epitaxy; MS = magnetron sputtering; MBE = molecular beam epitaxy.