Table 1.
Bulk chemical compositions of N, C, H contents of amorphous Ti3N4 materials prepared in this study and used as precursors for high-P,T annealing experiments. The compounds were produced by precipitation from THF solution following ammonolysis of dialkylamide metal precursors followed by treating at 350–400 °C in flowing NH3.
Element wt% | C | H | N |
---|---|---|---|
a-Ti3N4 precursor | |||
% Theoretical | - | - | 28.05 |
% Found 1 | 3.39 | 0.12 | 26.25 |
% Found 2 | 3.82 | 0.93 | 27.38 |
% Found 3 | 3.97 | 0.60 | 26.48 |
% Found 4 | 4.34 | 0.60 | 27.14 |