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. 2014 Aug 5;7(8):5633–5642. doi: 10.3390/ma7085633

Figure 7.

Figure 7

AD Al2O3 coated alumina substrate annealed in 100 °C steps from 200 °C to 800 °C. Deposition parameters: 100% N2, film thickness t ≈ 9 µm.