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. 2014 Aug 5;7(8):5633–5642. doi: 10.3390/ma7085633

Table 1.

Deposition conditions for the Al2O3 films.

Parameters Values
Orifice size of the nozzle 10 × 0.5 mm2
Distance nozzle—substrate 3 mm
Substrate temperature Room temperature
Gas flow rate 6 L/min
Carrier gas O2, N2, He, and mixtures as indicated in the experiments
Sweep rate 1 mm/s