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. 2016 Oct 12;9(10):827. doi: 10.3390/ma9100827

Figure 1.

Figure 1

Scanning electron microscopic images of the cell-free surfaces of the titanium-based coatings deposited on silicon. Silicon wafers were coated under higher oxygen (M1, scale bar: left 200 nm, right 200 nm), nitrogen (M2, scale bar: left 200 nm, right 200 nm), and argon (M3, left 200 nm, right 100 nm) pressures and under lower oxygen (M4, scale bar: left 200 nm, right 200 nm), nitrogen (M5, scale bar: left 200 nm, right 200 nm), and argon (M6, scale bar: left 200 nm, right 200 nm) pressures.