FIG. 4.

DNA repair in cells partially depleted of histone H4. (A) Growth analysis of BYtetH4-10D (t::HHF2) and BY52tetH4 (t::HHF2 rad52Δ) at either 5 (t::HHF2[5]) or 0.25 (t::HHF2[0.25]) μg of DOX/ml. (B, C, and D) UV light, HU, and MMS sensitivities of the strains indicated in the legend to Fig. 1, respectively. rad1Δ, asf1Δ, and rad52Δ strains are controls for UV light-, HU-, and MMS-induced DNA repair, respectively, and were analyzed at both 5 (t::HHF2[5]) and 0.25 (t::HHF2[0.25]) μg of DOX/ml. Since UV light, HU, and MMS sensitivities of wild-type, rad52Δ, asf1Δ, and rad1Δ strains were not affected by the presence or absence of DOX (data not shown), only the data for 5 μg of DOX/ml are shown for these strains.