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. Author manuscript; available in PMC: 2018 Mar 1.
Published in final edited form as: Technology (Singap World Sci). 2017 Feb 7;5(1):1–12. doi: 10.1142/S2339547817300013

Figure 1.

Figure 1

Microchip with injected electrodes for localized microchannel plasma generation. (a) Chip design, showing the injected electrodes, the main channel, and the localized plasma. (b) Injected electrodes (gallium) adjacent to a 50 mm wide main channel. (c) PDMS microchip with patterned gallium electrodes (100 mm wide) adjacent to a 50 mm wide main channel, with d = 50 μm. High-field regions from L = 300 μm to 800 μm (left to right). Low-field regions are 500 μm long. Cross-section of the microchannel and gallium electrodes is shown in the inset in (c). Reprinted from [88] with permission.