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. 2017 Jul 13;7:5307. doi: 10.1038/s41598-017-04814-2

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© The Author(s) 2017

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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(a) MNPAs manufacturing process: (1) colloidal mask formation by self-assembly of PS nanospheres on a silica substrate; (2) thermal evaporation of Ag onto the PS nanospheres; (3) nanosphere removal; (4) deposition by magnetron sputtering of a protecting layer of silica. (b) Nanoprism array geometry. The definitions of the relevant geometric parameters of the nanoarray are: the lattice parameter is a ₀ (corresponding to the PS nanospheres diameter), the distance between the nanoprisms d, the nanoprisms length L and height h. (c) SEM image in plane view of the synthesized MNPAs.