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. 2017 Jun 27;7(7):157. doi: 10.3390/nano7070157

Table 1.

Process parameters for the deposition of delafossite Mg-doped CuCrO2 by RF-sputtering.

Target material 3 at % Mg-doped CuCrO2
Substrate Fused quartz
Power (W·cm−2) 0.9
Magnetron Yes
Argon pressure P (Pa) 0.5
Target to substrate distance d (cm) 5