Table 2.
Reference | Fabrication Method | Characterization Method | Film Thickness (nm) | Young’s Modulus (GPa) |
---|---|---|---|---|
[15] | E-beam evaporation | Nanoindentation testing | 100 | 55.5 |
300 | 64.1 | |||
500 | 88.76 | |||
[16] | Metal plasma immersion ion implantation and deposition | Microcantilever beam testing | 19–62 | 69.1 |
[17] | E-beam evaporation | Microbeam testing | 1000 | 57 |
Nanoindentation testing | 74 | |||
[18] | Multi-user microelectromechanical systems processes | Microcantilever beam testing | 500 | 78 |
[19] | Sputtering | Microtensile testing | 180 | 61.0 |
310 | 49.5 | |||
500 | 53.9 | |||
680 | 53.1 | |||
950 | 51.2 | |||
1000 | 57.5 | |||
[20] | E-beam evaporation | Membrane deflection experiment | 300 | 53–55 |
500 | ||||
1000 |