Table 1. Field effect transistor data for organic semiconductors 1-5 using the nanodielectric III on n+-Si substrates.
| Semiconductor | μ, cm2·V-1·S-1 | Ion:Ioff* | VT, V |
|---|---|---|---|
| 1 | 0.06 (0.04) | 7 × 102 (104) | 0.08(−4) |
| III† | 0.03 | 6 × 102 | 0.05 |
| II | 0.02 | 1 × 103 | 0.06 |
| I | 0.04 | 8 × 102 | 0.03 |
| 2 | 0.002 (0.02) | 5 × 102 (104) | −0.17 (2) |
| 3 | 0.02 (0.2) | 6 × 102 (105) | 0.21 (14) |
| 4 | 0.003 (0.001) | 3 × 102 (104) | −0.22 (20) |
| 5 | 0.01 (0.02) | 2 × 102 (104) | −0.20 (−40) |
Operating biases were 0.0 to ±1.0 V. Data in parentheses are for 300-nm-thick SiO2 dielectric devices. All TFT mobilities (μ) and threshold voltages (VT) are calculated in the saturation regime (11).
Calculated at VG = 0.0 to ±1.0 V (0 to ± 100 V) and VDS = ±1.0 V (± 100 V).
Data for nanodielectric III on glass-ITO substrates.