Figure 1.

Maintaining silicon surfaces in a corrosive bath for up to 300 s, we obtained rough substrates with varying roughness. AFM images of etched silicon substrates with roughness in the 0.59–33 nm range (a–d). Corresponding Power Spectrum density functions, which describe the information content of the surfaces over multiple scales (e–h). From AFM images, average and root mean squared values of roughness were derived (i). From Power Spectrum density functions, fractal dimension of surfaces was derived (l). The table in the inset recapitulates surface properties for each of the considered time of etching (m).