Fig. 7. (a) Sketch of the scattering process leading to CBED disks that can be attributed to individual structure factors with Miller indices hkl. Intensity of the real measured pattern for aluminium in the crystal orientation 22̄0 is shown as an inlay. Reprinted from ref. 120 with permission from AAAS. (b) Final results of the fitting of the 22̄0 Bragg pattern of silicon giving rise to several very accurate structure factors from which the electron density distribution could be modeled. Reprinted from ref. 121 under the general license agreement of IUCr journals.
