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. Author manuscript; available in PMC: 2017 Sep 6.
Published in final edited form as: Nano Futures. 2017 May 2;1(1):015005. doi: 10.1088/2399-1984/aa6a48

Figure 3.

Figure 3

Measurement of spot size by scanning ion beam across edge of cleaved Si wafer. (a) Secondary electron image of wafer edge; (b) single line scan (blue) and fit to error function (green).