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. 2017 Sep 7;7:10885. doi: 10.1038/s41598-017-11461-0

Figure 8.

Figure 8

Evolution of transfer characteristics under PBS for the (a) reference IGZO device and the (b) Ta-induced polycrystalline IGZO TFT annealed at (b) 200 °C and (c) 300 °C under O2 atmosphere. NBS stability characteristics are shown in (d), (e), (f). The PBS (NBS) stress conditions are V GS = V TH + 20 V (V GS = V TH − 20 V) and V DS = 5.1 V.