Table 1.
Reference | Treatment Method | Material | Substrate | WCA Substrate (°) | WCA After Treatment (°) | WCA (°) After Irradiation, t (minutes) | Film Thickness (nm) | Transmittance (%) | Wavelength (nm) |
---|---|---|---|---|---|---|---|---|---|
128 | e-Beam evaporation | ZrO2/3 pairs of SiO2/TiO2 | Glass | 10 | ~0, t = 300.05 | 420 | 99 | 405 | |
90 | Spin coating | TiO2 (multiple layers) | HDPE | 46.7 | 0 | ~0, t = 1440 | |||
90 | Spin coating | TiO2 (multiple layers) | Borosilicate glass (BK7, SCHOTT) | 21.1 | 0 | ~0, t = 1440 | |||
146 | Spin coating | Niobia nanosheets | Soda-lime glass | 42 | <5, t = 80 | ||||
147 | GLAD/dry etching | Nanocone arrays | Borosilicate glassb | ~63 | 5 | >94.2 | 330-1800 | ||
108 | Electrospinning | Nanocrystalline TiO2 + DEA | Glass | 56.0 ± 1 | 2 ± 1 | >85 | 350-800 | ||
143 | Aqueous electrostatic layer-by-layer assembly | 120 TiO2/SiO2 bilayers | Glass | 125 | ~0, t = 60 | 2421 (avg.) | 93.5 (avg.) | 400-800 | |
148 | Sol-gel dip coating | TiO2 | ITO glass | 27 | 12, t = 30 | 30.1 (avg.) | |||
149 | Combined sol-gel dip coating | Glass | 89.5 | 23.5, t = 15 | 75 | 94.8 | 550 | ||
150 | Dip coating in 2-propanol | TiO2 | PET | <5, t = 90 | 76-95 | 400-800 | |||
151 | Dip coating in water | PtCl-TiO2 | PMMA | 136 | 6.1 | <5, t = 120 | 61-92 | 400-800 | |
109 | DC reactive magnetron sputtering | TiO2-x-Nx/TiO2 bilayer | ZnO-coated (h = 80 nm) soda-lime glass | 25 ± 1.5 | 14 ± 1, t = 60 | 830 | >71 | 400-1000 | |
152 | Sol-gel dip coating | TiO2 | Float glass | 39 ± 11 | 55 ± 6 | 0, t = 1440 | 300-400 | >80 | 380-1000 |
152, 153 | TiO2 | Pilkington Activ | 70 ± 6 | 0, t = 5760 | ~15 | >76 | 380-1000 | ||
154 | ICP-RIE | Nanostructures | Borosilicate glassb | 61 | 32 | 200 | >92 | 400-1000 | |
155 | Sol-gel dip coating | TiO2-Cu (1%) | Glass | 45.8 | 17.4, t = 30 | ~1000 | >72 | 2500-25 000 | |
156 | Ultrasonic nebulization | PEG/TiO2 hydrosol | Glass | <5 | 0, t = 0.17 | ~1.0 | |||
144 | ICP-RIE | Nanostructures | Borosilicate glassb | 62 | 21 | 400 | >89 | 400-900 | |
157 | PVD/MPII | TiO2-Fe | Glass | 9.95 | |||||
158 | Solvent-based spin coating, RIE | Nanostructures | Borosilicate glassb | 58.9 | 12.6 | 108 | >93.5 | 400-1800 | |
159 | Magnetron sputtering | TiO2 | Soda-lime glass | 18 | 5, t = 20 | >65 | 400-1100 | ||
160 | Reactive magnetron sputtering | SiO2/TiO2 bilayer | Quartz glass | 3.29 | 46.44 | >63 | 400-1000 | ||
161 | Hydrothermal synthesis | NH4OH | glass | <5 | ~100 | 98.4 | 500 |
Abbreviations: HDPE, high-density polyethylene; GLAD, glancing angle deposition technique; DEA, diethanolamine; ICP, inductively coupled plasma; RIE, reactive ion etching; PVD, physical vapor deposition; MPII, metal plasma ion implantation.
The material after a “+” sign in the material column indicates that the material is added to the precursor solution. A “−” sign indicates that the original substance is doped by the material that follows. Some entries are intentionally left blank as the literature did not provide information on those aspects.
BOROFLOAT 33, Schott.