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. 2017 Jul 6;4(9):1700191. doi: 10.1002/advs.201700191

Figure 1.

Figure 1

Synthesis of the UV‐reactive silk l‐fibroin (UV–LC) and the result of photolithography using UV–LC as a negative resist. a) B. mori cocoons are degummed for 60 min to obtain b) silk fibroin, and c) the l‐fibroin is then separated from the silk fibroin using formic acid; d) photoactive l‐fibroin (UV–LC precursor) is obtained by conjugating IEM to the l‐fibroin; e) by adding the photoinitiator (Irgacure 2959), the UV–LC resist can be synthesized; f) photolithography using UV–LC resist; g) optical images of the fabricated patterns (linewidth: 5 µm, zoom‐in image) shows that UV–LC has better lithographic performance than UV–Silk30. Scale bar: 50 µm. h) Dark‐field stereomicroscopic photograph of double immunofluorescence staining with Nestin (green fluorescence) and nuclear staining (blue DAPI staining) of fetal neural stems cells that were guided to be cultured on a micropatterned UV–LC resist (dash line) on a silicon substrate. Scale bar: 100 µm.