Figure 2.

Bulk defect: (a) Intensity distribution integrated over the period around a single void nanoplane $L_x=80$ nm, $L_y=2$ μm, $L_z=500$ nm. (b) Intensity distribution integrated over the period as a result of the coherent superposition of the scattered waves from two void nanoplanes $L_x=80$ nm, $L_y=1.5$ μm, $L_z=50$ nm, separated by 2 μm in x-direction. Surface defect: Intensity pattern integrated over the period from a single inhomogeneity (hemisphere with $R=50$ nm) (c) on the non-excited fused silica surface ($\epsilon =2.105$), (d) on the excited metallic fused silica surface ($\epsilon =-1+0.5\cdot i$). Laser wavelength is fixed to be $\lambda =800$ nm.