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. 2017 Sep 13;121(40):7641–7654. doi: 10.1021/acs.jpca.7b05933

Figure 9.

Figure 9

Trimers and longer oligomers (CHO compounds only) detected in methacrolein photooxidation experiments in the smog chamber in control conditions without clouds (a) and in triphasic conditions with two cloud events (b). Molecular formulas of the repeating units can be associated with (left to right) methacrolein (C4H6O), 2-methylglyceric acid (C4H8O4), glycolaldehyde (C2H4O2), methylglyceric acid (C4H6O3 because of H2O loss), hydroxyacetic acid (C2H2O2), acetone (C3H6O), pyruvic acid/hydrolyzed methylglyoxal (C3H4O3), and 2-hydroxy-2-methylbutanedial (C5H8O3).

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