Table 1. Main components content of cuticular wax under low temperature and VIGS stimulated.

Class	Component	WT (%)	LT (%)	CK (%)	wri1 (%)
Malus asiatica Nakai	Alkanes	23.54	31.05	25.57	34.58
	Organic acid	40.88	28.95	40.88	36.64
	Esters	4.68	4.33	4.68	4.43
Malus sieversii	Alkanes	29.87	33.08	29.87	33.29
	Organic acid	39.97	35.71	39.97	29.81
	Esters	3.12	2.23	3.12	1.82