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. 2017 Oct 26;7:14146. doi: 10.1038/s41598-017-14291-2

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© The Author(s) 2017

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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(a–c) TEM images and (d–f) TEM-EDS elemental mapping images after PCT of 0, 15, and 40 h for a SiON:H film, respectively. As-deposited sample was deposited on Si substrate at 160 °C and a N₂O flow of 14 sccm. The blue, green and red parts in (d,e) and (f) represent SiO₂:H, SiON:H and Si substrate regions, respectively. The scales of all the images are the same as shown in Fig. 1(f).