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Mass density and atomic concentration of SiON:H films as a function of PCT time. The as-deposited film was deposited at 160 °C and 10 sccm for N2O. The density and composition after PCT indicates the values in the oxidized layers.
| PCT time h | Density g/cm3 | Si at% | O at% | N at% | H at% |
|---|---|---|---|---|---|
| 0 | 2.10 | 29.6 | 33.0 | 21.1 | 16.3 |
| 30 | 2.00 | 30.1 | 61.8 | — | 8.1 |
| 50 | 2.00 | 29.3 | 62.2 | — | 8.2 |
| 70 | 2.00 | 29.0 | 63.0 | — | 8.0 |
