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. 2017 Oct 11;10(10):1164. doi: 10.3390/ma10101164

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© 2017 by the authors.

Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

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SEM images of the CP Ti surface etching in H₂SO₄/HCl at different temperatures. (a) H₂SO₄ (90 °C)/HCl (80 °C) (1000× magnification); (b) H₂SO₄ (90 °C)/HCl (80 °C) (10,000× magnification); (c) H₂SO₄ (100 °C)/HCl (80 °C) (1000× magnification); (d) H₂SO₄ (90 °C)/HCl (80 °C) (10,000× magnification); (e) H₂SO₄ (110 °C)/HCl (80 °C) (1000× magnification); (f) H₂SO₄ (110 °C)/HCl (80 °C) (10,000× magnification); (g) H₂SO₄ (120 °C)/HCl (70 °C) (1000× magnification); (h) H₂SO₄ (90 °C)/HCl (70 °C) (10,000× magnification); (i) H₂SO₄ (120 °C)/HCl (60 °C) (1000× magnification); (j) H₂SO₄ (90 °C)/HCl (60 °C) (10,000× magnification); (k) H₂SO₄ (120 °C)/HCl (80 °C) (1000× magnification); and (l) H₂SO₄ (120 °C)/HCl (80 °C) (10,000× magnification).