Figure 6.

Comparison of features on DNA origami triangle master templates with a ca. 2 nm or a ca. 5 nm thick Al₂O₃ layer and PLLA stamps. AFM height images and corresponding cross-sectional analysis of origami triangles after (a) deposited on silicon wafers, (b) 20 cycles (top) or 50 cycles (bottom) of ALD of Al₂O₃, and (d) pattern transfer to PLLA stamps, and (c) their negative replicas on the PLLA stamps. White lines on the AFM images indicate where the cross-sections were determined. Scale bars represent 200 nm.