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(a) X-ray absorption characterization at Zn L-edges is shown for Zn(O,S) thin films deposited on SiO2 (i.e., S10_20:10% pulse ratio on SiO2 substrate, 20 cycles of deposition); (b) X-ray absorption characterization at Zn K-edges are shown for 33% pulse ratio thin films deposited on SiO2 (sample name S33_21) and nanoporous TiO2 (sample name T33_21).
