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. 2017 Nov 30;7:16670. doi: 10.1038/s41598-017-16505-z

Figure 2.

Figure 2

Left: Contour plot of the peak CE at λ = 1550 nm of the linearly apodized GC realized in 260 nm SOI platform, as a function of etch depth and of the linear apodization factor R. Right: maximum CE at the central wavelength of 1550 nm for the linearly apodized GC based on 220 nm SOI (red plot) and 260 nm (blue plot).