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. 2017 Oct 26;17(11):2452. doi: 10.3390/s17112452

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© 2017 by the authors.

Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

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Thermal measurements in the presence of SAWs. (a) Heating of the LN substrate versus time (SAW activation at t = 0). The insets show five images from the thermal camera at t = 0 s, 50 s, 100 s, 300 s and 595 s, with the regions of interest (ROIs) used for calculating the average substrate temperature. (b) Temperature profile of the LN substrate at thermal equilibrium after SAW generation. A schematic of the microchannel is superimposed to the image. SAW direction from IDT is specified by the arrows. Color bar ranges from 28.8 °C to 42.0 °C.