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Lithography-based fabrication process [41]. a Deposit aluminum mask on both sides of Nafion film. b Thin down passive area with plasma etch. c Remove aluminum mask and perform ion-exchange to make Nafion stiffer. d Deposit PR and then pattern PR through lithography. e Perform another ion-exchange and electroless palting of platinum to create IPMC electrodes. f Remove PR and perform final treatment and g Cut the patterned IPMC into a fin shape
