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. 2018 Jan 10;13:8. doi: 10.1186/s11671-017-2419-8

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© The Author(s). 2018

Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

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Fig. 17 — Conducting AFM (C-AFM) topographs of TiO₂ films. a Schematic of C-AFM measurements (b) Typical I-V curves of TiO₂ films using C-AFM tip as a top electrode. c At V_tip = 8 V, mapping of the current flow through the surface just after the forming operationshows locally distributed conducting regions. d TiO₂ surface in the HRS shows locally distributed conducting regions disappear after reset operation with V_tip = 1 V [182]