Figure 2.
Characterization of the fidelity of the solvent-assisted nanotransfer molding. (A–C) SEM images of master ridges (A), replica ridges (B), and replica grooves (C). The negative topography C in the juxtaposition has been flipped horizontally for consistency. (D,E) Sectional AFMs of 1-μm-spaced master (blue) and replica (red) ridges (D), and 1.5-μm-spaced replica ridges (blue) and grooves (red) (E). (F–I) SEM images of asymmetric sawteeth (F), nanoposts (G), curved ridges (H), and kinked ridges (I). Scale bars, 1.5 μm (A–C), 1 μm (F), and 2 μm (G–I).