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. Author manuscript; available in PMC: 2019 Mar 1.
Published in final edited form as: J Chem Thermodyn. 2017 Nov 15;118:127–138. doi: 10.1016/j.jct.2017.11.004

Table 2.

Magnitude of different sources of uncertainties for the solid films used in this study to calculate the enthalpy of sublimation (ΔHs).

Gas ΔHs
/kJ·mol−1
uΔHsa
/kJ·mol−1
σrb
/kJ·mol−1
uTc
/mK
uΔMd
/kg
×10–28
ufe
/µHz

298
K
uslopef
/s−2
× 10−3
uGfilmg
/MPa
uρSih
/Kg·m−3
uGSii
/MPa
Ne 1.90 0.29 0.06 42 3.35 <86 55 40 1 <<6.2
N2 7.34 0.48 0.13 33 0.23 1.5 51
Ar 7.79 0.24 0.03 63 2.98 4.6 96
O2 9.26 0.42 0.05 19 1.78 54 32
Kr 11.53 0.40 0.14 48 6.12 5.3 160
Xe 15.79 0.29 0.04 4 3.27 5.3 177
CO2 28.84 1.05 0.32 4 5.44 5.7 120
H2O 54.46 5.28 0.57 7 10.17 5 216 6.2

All uncertainties listed in the table are standard uncertainties u (0.68 confidence interval).

a

uΔHs, combined standard uncertainty in ΔHs of each gas

b

σr, standard deviation of ΔHs values determined independently from each experimental run

c

uT, combined maximum standard uncertainty values in temperature including the corrections from radiative heat load

d

uΔM, standard uncertainty in atomic/molecular mass of the gas

e

uf, standard uncertainty in the resonance frequency

f

uslope, standard fitting error (maximum values) in the slope of line (Figure 5)

g

uGfilm, standard uncertainty in the shear modulus of each solid film

h

uρSi, standard uncertainty in the density of silicon

i

uGSi, standard uncertainty in the shear modulus of silicon